It is possible to form films with highly accurate sputter patterns.A cross-secUltra high-definition metal mask for sputtering.
A cross-sectional shape suitable for sputtering applications can be formed, by controlling the etching process with high precision.
It is possible to form films with highly accurate sputter patterns.

Complex micro channels can be formed by stacking different patterns of thin plate materials combining through etching and half etching.
It can be used for heat dissipation and cooling device parts such as heat pipes and vapor chambers, and for applications such as ink channels.

Metal separator for fuel cells. In order to flow gas and air evenly, a fine flow path is patterned on the surface.
Unlike the press method, it is possible to form ultra-fine Micro Channel.

Aperture in camera module of Smartphone / Cell phone.

Metal speaker mesh used for flat-panel TV, etc.
It is possible to design logo marks etc., by controlling the opening dimension.

Grid electrodes for the corona charging device embedded in laser printers, and discharging plate (needle) for the electrostatic discharging device.

Metal masks used for depositing metal structures on the silicon wafer.

Used for a wide-range of purposes, such as oil filter for vehicles, air filter for electric appliances, and bath water filters, and others.

Decorative parts created by the process technologies including etching and plating.
Serve various purposes or meet various needs, including metal bookmark for gift, remembrance purposes, or naming plate or logo on the products.