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High-definition Metal Mask

TOPPAN manufactures and sells ultra-high-definition metal masks for sputtering, making full use of the photolithography technology it has cultivated since its founding.
The etching process is controlled with high precision to form a cross-sectional shape suitable for sputtering, making it possible to form patterns with high precision.

Example of opening pattern

  • 【Slot type pattern example】

  • 【Slit type pattern example】

Specification

  • Base material

    Copper / ferrous metals (t=0.015-0.30mm)

    Minimum dimension

    Aperture Size ≈ base material thickness
    Slit width ≈ base material thickness
    Line width ≈ 50% of base material thickness

  • Dimensional accuracy / Guaranteed value

    Base material thickness
    0.025mm    		 Base material thickness
    0.100mm
    Aperture Size ±0.005 (±0.002)mm ±0.015mm
    Slit width ±0.005 (±0.002)mm ±0.015mm
    Line width ±0.005 (±0.002)mm ±0.015mm

    Value of ( ) is actual data

Metal etching